Want to post a buying lead? If you are not a member yet, please select the specific/related part number first and then fill the quantity and your contact details in the "Request for Quotation Form" on the left, and then click "Send RFQ".Your buying lead can then be posted, and the reliable suppliers will quote via our online message system or other channels soon.
The INA-01170 is a low-noise silicon bipolar Monolithic Microwave Integrated Circuit (MMIC) feedback amplifier housed in a hermetic, high reliability package. It is designed for narrow or wide bandwidth industrial and military applications that require high gain and low noise IF or RF amplification.
The INA series of MMICs is fabricated using HP's 10 GHz fT, 25ÊGHz f MAX, ISOSAT™-I silicon bipolar process which uses nitride self-alignment, submicrometer lithography, trench isolation, ion implantation, gold metallization and polyimide intermetal dielectric and scratch protection to achieve excellent performance, uniformity and reliability.
INA-01170 Maximum Ratings
Parameter
Absolute Maximum[1]
Device Current
50 mA
Power Dissipation[2,3]
400 mW
RF Input Power
+13 dBm
Junction Temperature
200°C
Storage Temperature
65 to 200°C
Thermal Resistance[2,4]: jc = 140°C/W
Notes: 1. Permanent damage may occur if any of these limits are exceeded. 2. TCASE = 25°C. 3. Derate at 7.1 mW/°C for TC > 144°C. 4. See MEASUREMENTS section "Thermal Resistance" for more information.
INA-01170 Features
• Cascadable 50 Gain Block • Low Noise Figure: 1.7 dB Typical at 100 MHz • High Gain: 32.5 dB Typical at 100 MHz • 3 dB Bandwidth: DC to 500ÊMHz • Unconditionally Stable (k>1) • Hermetic Gold-Ceramic Surface Mount Package
INA-02100 General Description
The INA-02100 is a low-noise silicon bipolar Monolithic Microwave Integrated Circuit (MMIC) feedback amplifier chip. It is designed for narrow or wide bandwidth industrial and military applications that require high gain and low noise IF or RF amplification.
The INA series of MMICs is fabricated using HP's 10 GHz fT, 25 GHz fMAX, ISOSAT™-I silicon bipolar process which uses nitride self-alignment, submicrometer lithography, trench isolation, ion implantation, gold metallization and polyimide intermetal dielectric and scratch protection to achieve excellent performance, uniformity and reliability.
The recommended assembly procedure is gold-eutectic die attach at 400°C and either wedge or ball bonding using 0.7 mil gold wire.[1]
INA-02100 Maximum Ratings
Parameter
Absolute Maximum[1]
Device Current
50 mA
Power Dissipation[2,3]
400 mW
RF Input Power
+13 dBm
Junction Temperature
200°C
Storage Temperature
65 to 200°C
Thermal Resistance[2]: jc = 60°C/W
Notes: 1. Permanent damage may occur if any of these limits are exceeded. 2. TMounting Surface (TMS) = 25°C 3. Derate at 16.7 mW/°C for TMS > 176°C.3. Derate at 16.7 mW/°C for TMS > 176°C.
INA-02100 Features
• Cascadable 50 Gain Block • Low Noise Figure: 2.0 dB Typical at 0.5 GHz • High Gain: 31.5 dB Typical at 0.5 GHz 25.0 dB Typical at 1.5 GHz • 3 dB Bandwidth: DC to 1.0 GHz • Unconditionally Stable (k>1)