IRFZ44VZLPbF

Features: ` Advanced Process Technology` Ultra Low On-Resistance` 175 Operating Temperature` Fast Switching` Repetitive Avalanche Allowed up to Tjmax` Lead-FreeSpecifications Parameter Max. Units ID @ TC = 25 Continuous Drain Current VGS@ 10V (Silicon Limited) 57 A ...

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SeekIC No. : 004377634 Detail

IRFZ44VZLPbF: Features: ` Advanced Process Technology` Ultra Low On-Resistance` 175 Operating Temperature` Fast Switching` Repetitive Avalanche Allowed up to Tjmax` Lead-FreeSpecifications Parameter ...

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Part Number:
IRFZ44VZLPbF
Supply Ability:
5000

Price Break

  • Qty
  • 1~5000
  • Unit Price
  • Negotiable
  • Processing time
  • 15 Days
Total Cost: $ 0.00

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Upload time: 2025/2/15

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Product Details

Description



Features:

` Advanced Process Technology
` Ultra Low On-Resistance
` 175 Operating Temperature
` Fast Switching
` Repetitive Avalanche Allowed up to Tjmax
` Lead-Free



Specifications

Parameter
Max.
Units
ID @ TC = 25
Continuous Drain Current VGS@ 10V (Silicon Limited)
57
A
ID @ TC = 100
Continuous Drain Current, VGS@10V
40
IDM
Pulsed Drain Current
230
PD @ TC = 25
Power Dissipation
92
W
Linear Derating Factor
0.61
W/
VGS
Gate-to-Source Voltage
±20
V
EAS (Thermally limited)
Single Pulse Avalanche Energy
73
mJ
EAS (Tested)
Single Pulse Avalanche Energy Tested Value
110
IAR
Avalanche Current
See Fig.12a,12b,15,16
A
EAR
Repetitive Avalanche Energy
mJ
TJ
TSTG
Operating Junction
Storage Temperature Range
-55 to + 175
Soldering Temperature, for 10 seconds
300 (1.6mm from case)
Mounting Torque, 6-32 or M3 screw
10 lbfin (1.1Nm)





Description

Specifically designed for  Automotive applications  this HEXFET® Power MOSFET IRFZ44VZLPbF utilizes the latest processing techniques to achieve extremely low onresistance per silicon area. Additional features of this design are a 175 junction operating temperature, fast switching speed and improved repetitive avalanche rating . The IRFZ44VZLPbF features combine to make this design an extremely efficient and reliable device for use in Automotive applications and a wide variety of other applications.




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