Features: • Power MESFET Process• Interconnects:• 2 Global (one airbridge)• 1 Local• High-Q Passives• Bulk & Thin Film Resistors• Backside Vias Optional• High Volume Production Processes• Validated Models and Design SupportApplication•...
TQHiP: Features: • Power MESFET Process• Interconnects:• 2 Global (one airbridge)• 1 Local• High-Q Passives• Bulk & Thin Film Resistors• Backside Vias Optional...
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Operating Temperature Range | -65 to +150 | ºC |
Capacitor Breakdown Voltage-Typ. | 40 | V |
Min. | 25 | V |
TriQuint's TQHiP process is our robust, high power density MESFET process. It provides a straight-forward, low cost process for a variety of circuits and applications. Its high operating and breakdown voltages make it ideal for wireless or wired infrastructure applications. A thick (4 m) gold airbridge complements of TQHiP the 2 m thick gold global metal and 0.5 m thick gold surface layer for wiring flexibility and interconnect density. Precision NiCr resistors and high value MIM capacitors of TQHiP are included.