MOSFET N+P 30V 2.3A 8-SOIC
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Series: | HEXFET® | Manufacturer: | International Rectifier |
FET Type: | N and P-Channel | FET Feature: | Logic Level Gate |
Drain to Source Voltage (Vdss): | 30V | Current - Continuous Drain (Id) @ 25° C: | 3.5A, 2.3A |
Gate-Source Cutoff Voltage : | - 4.5 V | Rds On (Max) @ Id, Vgs: | 100 mOhm @ 2.2A, 10V |
Vgs(th) (Max) @ Id: | 1V @ 250µA | Gate Charge (Qg) @ Vgs: | 14nC @ 10V |
Input Capacitance (Ciss) @ Vds: | 190pF @ 15V | Power - Max: | 2W |
Mounting Type: | Surface Mount | Package / Case: | 8-SOIC (0.154", 3.90mm Width) |
Supplier Device Package: | 8-SO |
Symbol | Maximum | Units | |||
N-Channel | P-Channel | ||||
Drain-Source Voltage | VDS | 30 | V | ||
Gate-Source Voltage | VGS | ± 20 | |||
Continuous Drain Current | TA = 25 | ID | 3.5 | -2.3 | A |
TA = 70 | 2.8 | -1.8 | |||
Pulsed Drain Current | IDM | 16 | -10 | ||
Continuous Source Current (Diode Conduction) | IS | 1.7 | -1.3 | ||
Maximum Power Dissipation | TA = 25 | PD | 2.0 | W | |
TA = 70 | 1.3 | ||||
Single Pulse Avalanche Energy | EAS | 44 | 57 | mJ | |
Avalanche Current | IAR | 2.0 | -1.3 | A | |
Repetitive Avalanche Energy | EAR | 0.25 | mJ | ||
Peak Diode Recovery dv/dt | dv/dt | 5.0 | -5.0 | V/ ns | |
Junction and Storage Temperature Range | TJ, TSTG | -55 to + 150 |
Fifth Generation HEXFETs IRF9952 from International Rectifier utilize advanced processing techniques to achieve extremely low on-resistance per silicon area. This benefit, combined with the fast switching speed and ruggedized device design that HEXFET Power MOSFETs are well known for, provides the designer with an extremely efficient and reliable device for use in a wide variety of applications.
The SO-8 IRF9952 has been modified through a customized leadframe for enhanced thermal characteristics and multiple-die capability making it ideal in a variety of power applications. With these improvements, multiple devices can be used in an application with dramatically reduced board space. The package is designed for vapor phase, infra red, or wave soldering techniques.