AT-42085

Features: • High Output Power:20.5 dBm Typical P1 dB at 2.0 GHz• High Gain at 1 dBCompression:14.0 dB Typical G1 dB at 2.0 GHz• Low Noise Figure:2.0 dB Typical NFO at 2.0 GHz• High Gain-BandwidthProduct: 8.0 GHz Typical fT• Low Cost Plastic PackageSpecifications ...

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AT-42085 Picture
SeekIC No. : 004290083 Detail

AT-42085: Features: • High Output Power:20.5 dBm Typical P1 dB at 2.0 GHz• High Gain at 1 dBCompression:14.0 dB Typical G1 dB at 2.0 GHz• Low Noise Figure:2.0 dB Typical NFO at 2.0 GHz•...

floor Price/Ceiling Price

Part Number:
AT-42085
Supply Ability:
5000

Price Break

  • Qty
  • 1~5000
  • Unit Price
  • Negotiable
  • Processing time
  • 15 Days
Total Cost: $ 0.00

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Upload time: 2024/11/12

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Product Details

Description



Features:

• High Output Power:
20.5 dBm Typical P1 dB at 2.0 GHz
• High Gain at 1 dB
Compression:

14.0 dB Typical G1 dB at 2.0 GHz
• Low Noise Figure:
2.0 dB Typical NFO at 2.0 GHz
• High Gain-Bandwidth
Product: 8.0 GHz Typical fT
• Low Cost Plastic Package





Specifications

Symbol
Parameter
Units
Absolute Maximum[1]
VEBO
Emitter-Base Voltage
V
1.5
VCBO
Collector-Base Voltage
V
20
VCEO
Collector-Emitter Voltage
V
12
IC
Collector Current
mA
80
PT
Power Dissipation [2,3]
mW
500
Tj
Junction Temperature
°C
150
TSTG
Storage Temperature
°C
-65 to 150





Description

Hewlett-Packard's AT-42085 is a general purpose NPN bipolar transistor that offers excellent high frequency performance. The AT-42085 is housed in a low cost .085" diameter plastic package. The 4 micron emitter-to-emitter pitch enables this transistor to be used in many different functions.

The 20 emitter finger interdigitated geometry yields a medium sized transistor with impedances that are easy to match for low noise and medium power applications. Applications of AT-42085 include use in wireless systems as an LNA, gain
stage, buffer, oscillator, and mixer. An optimum noise match near 50 W up to 1 GHz, makes this device easy to use as a low noise amplifier.

The AT-42085 bipolar transistor is fabricated using Hewlett-Packard's 10 GHz fT Self-Aligned-Transistor (SAT) process. The die is nitride passivated for surface protection. Excellent device uniformity, performance and reliability of AT-42085 are produced by the use of ionimplantation, self-alignment techniques, and gold metalization in the fabrication of this device.




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